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<dc:title xml:lang="fr">Mesure et dangerosité des métaux nobles pour les photodétecteurs à avalanche à photon unique</dc:title>
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<dc:subject xml:lang="fr">Contamination métallique</dc:subject>
<dc:subject xml:lang="fr">Métaux nobles</dc:subject>
<dc:subject xml:lang="fr">VPD-DC-ICPMS</dc:subject>
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<dc:subject xml:lang="fr">Comportement en température</dc:subject>
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<dc:subject xml:lang="en">Metallic contamination</dc:subject>
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<dcterms:abstract xml:lang="fr">Les métaux nobles (Au, Ag, Pt, Ir, Pd et Ru) sont utilisés en salle blanche pour la réalisation de dispositifs électroniques ou peuvent être apportés par les équipements de fabrication (composants d’alliage par exemple). Il a été montré qu’ils pouvaient impacter fortement les dispositifs. Il est alors nécessaire de procéder au contrôle des équipements pour diagnostiquer au plus tôt une contamination. Or, il n’existe pas de technique industrielle pour leur suivi et ce à des niveaux d’au moins 5.109 at.cm-2 - recommandation ITRS. Il se pose la question de la pertinence de ces recommandations en fonction des types de dispositifs (SPAD notamment). Dans un premier temps, les travaux ont consisté à développer une technique physico-chimique pour l’analyse des métaux nobles sur silicium par VPD-DC-ICPMS. Enfin, leur dangerosité vis-à-vis des équipements et des dispositifs a été évaluée d’après leur comportement en température et le DCR généré sur SPAD.</dcterms:abstract>
<dcterms:abstract xml:lang="en">Noble metals (Au, Ag, Pt, Ir, Pd and Ru) are used for the fabrication of microelectronics devices or can be brought by manufacturing tools (alloy components for example). It is well known that these impurities are detrimental to the efficiency of the devices. This implies a real and present need for control of their introduction in clean rooms to diagnose as soon as possible a contamination. Yet, there are no industrial technique for their follow-up at levels about 5.109 at.cm-2 - ITRS recommendations. The relevance of these recommendations according to the electronic device (SPAD in particular) could be questioned. At first, this study consisted in developing a physicochemical technique for the analysis of noble metals on Si wafers by VPD-DC-ICPMS. Then, their dangerousness towards tools and devices was established according to their behavior in temperature and the DCR generated on SPAD devices.</dcterms:abstract>
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